History of Semicondutor Metrology Systems

How it started

The Semiconductor Metrology Systems division is a leader in the field of metrology and repair solutions for photomasks. The success story began in 1994 when the company delivered its first Aerial Image Measurement technology (AIMS) system, the MSM 100, to the semiconductor industry where it was used to evaluate the functionality of photomasks.

SMS has also introduced an innovative method to repair defects on photomasks. Together with NaWoTec GmbH, SMS developed the MeRiT system which is used to repair critical defects using electron beam-based technologies. One of the more recent innovative solutions is the PROVE system which enables customers to measure the positional accuracy of structures on photomasks. Today these systems are standard in the semiconductor industry.

1994

Delivery of first AIMS™ system: MSM 100 (g-line, i-line, DUV).

2000

First fully automated Photomask Inspection System AIMS™ fab (i-line, 248 nm).

2001

Carl Zeiss SMT enters into a collaboration with NaWoTec GmbH in Rossdorf, Germany, to bundle their competencies for the joint development of the MeRiT® MG electron-beam mask repair system.

2002

First delivery of fully automated AIMS™ fab 193.

2004

Market launch of MeRiT® MG mask repair system.

2006

First delivery of AIMS™ 45-193i.

2008

Carl Zeiss SMT aquires Pixer Technlogy in Israel for its SMS Division.

2010

Market launch of the PROVE® system.

2011

The four microchip manufacturers, Intel, Samsung, Globalfoundries and TSMC sign an agreement to support the development of the AIMS™ EUV photomask analysis system.

 
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